Open AccessModel for nucleation of catalyst-free III-V nanowires on patterned substrates
Author(s) -
Yury Berdnikov,
А. С. Соколовский,
N. V. Sibirev
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1482/1/012030
Subject(s) - nanowire , nucleation , materials science , substrate (aquarium) , catalysis , nanotechnology , diffusion , chemical physics , chemical engineering , chemistry , thermodynamics , physics , biochemistry , oceanography , organic chemistry , geology , engineering
Catalyst-free growth of III-V nanowires enables different optoelectronic applications though usually requires substrate patterning to control the size and position of nanowires. However, the impact of substrate modification on the nanowire nucleation is not well-understood yet. The theoretical approach of this work studies the effect of substrate boundaries and adatom diffusion on the nucleation rate of catalyst-free III-V NWs on substrates with circularly symmetric patterning. In the model results, we distinguish and demonstrate four different scenarios of nanowire nucleation, depending on the properties of the patterned and unpatterned surfaces.