
Some features of controlling the composition of a porous silicon surface with the use of “simplest” post-treatment techniques
Author(s) -
A. S. Lenshin,
V. M. Kaskarov,
P. V. Seredin,
Anton O. Belоrus,
В. А. Мошников
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1482/1/012012
Subject(s) - porous silicon , silicon , materials science , porosity , composition (language) , porous medium , infrared spectroscopy , chemical engineering , infrared , surface (topology) , chemical composition , nanotechnology , chemistry , optoelectronics , composite material , organic chemistry , optics , engineering , physics , mathematics , linguistics , philosophy , geometry
The article is concerned with the investigation of techniques of the post-treatment of porous silicon. To study the features of changing the composition of the chemical bonds of the surface of porous silicon, we used the method of infrared spectroscopy.