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Influence of gallium and arsenic deposition rates on the GaAs planar nanowire morphology
Author(s) -
A. A. Spirina,
Nataliya L. Shwartz
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1482/1/012007
Subject(s) - arsenic , nanowire , gallium , morphology (biology) , planar , materials science , deposition (geology) , nanotechnology , optoelectronics , biology , metallurgy , zoology , computer science , paleontology , computer graphics (images) , sediment

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