Open AccessGas flow control design vapor deposition in chemical facilities
Author(s) -
Totok Dermawan,
N. P. Priambogo,
Sugeng Rianto
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1436/1/012109
Subject(s) - chemical vapor deposition , coating , volumetric flow rate , materials science , deposition (geology) , flow (mathematics) , flow control valve , environmental science , process engineering , mechanical engineering , engineering , mechanics , nanotechnology , physics , geology , paleontology , sediment
Design of gas flow control in LabVIEW based chemical vapor deposition facilities. To make the TRISO layer in nuclear fuel, argon, acetone, MTS, hydrogen and propelling gas are used. Currently, the regulation of gas flow in fluidized bed chemical vapor deposition facilities is done manually. Coating by adjusting the flow rate of 2 different gas alloys. The system is designed to obtain a proper coating, using Arduino to control the servo motor which regulates the gas valve. The results obtained that the valve can rotate between the range of 0 degrees to 180 degrees, with the addition of 0.5 degrees per step.