Open AccessThe effect of argon:oxygen gas ratio on the energy gap of nickel-chromium oxide thin film deposited using DC sputtering techniques
Author(s) -
T. U. Agista,
Ihwanul Aziz,
Bangun Pribadi,
Dwi Priyantoro
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1436/1/012089
Subject(s) - argon , analytical chemistry (journal) , sputtering , materials science , thin film , band gap , oxygen , oxide , chromium , nickel oxide , argon gas , deposition (geology) , nickel , substrate (aquarium) , transmittance , chemistry , metallurgy , nanotechnology , optoelectronics , paleontology , oceanography , organic chemistry , chromatography , sediment , geology , biology
Nickel chromium oxide (NiCrO) deposition has been carried out on a glass substrate with a variation of the Argon / oxygen (Ar:O) gas ratio using DC sputtering. The purpose of this study is to determine the effect of the Ar: O gas ratio on the energy gap of the NiCrO layer. NiCrO thin film deposition was carried out using a variation ratio of Argon gas and oxygen 60:40, 70:30, 80:20, and 90:10. To determine the phase formed was analyzed using X-Ray Diffraction (XRD). UV-Vis spectrophotometer test was carried out to determine the transmittance value (% T), then from this data, it can be used to calculate the gap energy. Based on the results of the variation of the gas ratio obtained the largest energy gap of 3.44 eV on the gas ratio variation of 80:20.