Open AccessEUV spectroscopy of optically thin germanium plasmas in the 9-18 nm region
Author(s) -
Oisín Maguire,
D. Kos,
Gerry O’Sullivan,
Emma Sokell
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1412/19/192016
Subject(s) - extreme ultraviolet lithography , germanium , spectral line , spectroscopy , ion , laser , plasma , line (geometry) , extreme ultraviolet , atomic physics , materials science , physics , optoelectronics , optics , nuclear physics , silicon , geometry , mathematics , quantum mechanics , astronomy
Synopsis EUV spectra have been recorded from optically-thin germanium laser produced plasmas created using a high-powered TEA CO 2 laser. The Cowan suite of atomic codes has been used to identify previously unidentified lines in Ge VI-XI. The absence in the spectra of Δn=0 transitions for ion stages lower than Ge 9+ has been interpreted by calculating line strength ratios for of Δn=0 to Δn=1 transitions for the relevant ion stages.