Open AccessSpectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography
Author(s) -
Oscar Versolato,
Alex Bayerle,
Muharrem Bayraktar,
Lars Behnke,
Hendrik Bekker,
Zoi Bouza,
J. Colgan,
J. R. Crespo LópezUrrutia,
Mart Johan Deuzeman,
Ronnie Hoekstra,
Dmitry Kurilovich,
B. Liu,
Randy Meijer,
Amanda Neukirch,
Lucas Poirier,
Subam Rai,
A N Ryabtsev,
Joris Scheers,
Ruben Schupp,
John Sheil,
Francesco Torretti,
Wim Ubachs,
Stefan Witte
Publication year - 2020
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1412/19/192006
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , tin , nanolithography , plasma , materials science , laser , optoelectronics , optics , physics , fabrication , medicine , alternative medicine , pathology , quantum mechanics , metallurgy
Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laser-driven plasma and present a surprising answer to the key question: what makes that light?