Detailed Monte-Carlo simulation of PMMA chain scissions in e-beam lithography | Zendy

F. A. Sidorov | Zendy; A. E. Rogozhin | Zendy

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Detailed Monte-Carlo simulation of PMMA chain scissions in e-beam lithography

Author(s) -

F. A. Sidorov,

A. E. Rogozhin

Publication year - 2019

Publication title -

journal of physics conference series

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.21

H-Index - 85

eISSN - 1742-6596

pISSN - 1742-6588

DOI - 10.1088/1742-6596/1410/1/012243

Subject(s) - monte carlo method , polymer , materials science , monomer , beam (structure) , ionization , lithography , resist , random walk , permeation , molecular physics , polymer chemistry , chemical physics , chemistry , nanotechnology , composite material , physics , optics , optoelectronics , organic chemistry , ion , statistics , mathematics , layer (electronics) , biochemistry , membrane

Detailed Monte-Carlo simulation of e-beam events in PMMA/Si system has been carried out. Polymer chains are modeled using random walk algorithm with subsequent assignment of simulated e-beam events to certain monomers. The processes leading to PMMA chain scission are determined to be ionization events on C atoms of PMMA backbone bond due to analysis of resist weight distributions, obtained by gel permeation chromatography.

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