Open AccessDetailed Monte-Carlo simulation of PMMA chain scissions in e-beam lithography
Author(s) -
F. A. Sidorov,
A. E. Rogozhin
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1410/1/012243
Subject(s) - monte carlo method , polymer , materials science , monomer , beam (structure) , ionization , lithography , resist , random walk , permeation , molecular physics , polymer chemistry , chemical physics , chemistry , nanotechnology , composite material , physics , optics , optoelectronics , organic chemistry , ion , statistics , mathematics , layer (electronics) , biochemistry , membrane
Detailed Monte-Carlo simulation of e-beam events in PMMA/Si system has been carried out. Polymer chains are modeled using random walk algorithm with subsequent assignment of simulated e-beam events to certain monomers. The processes leading to PMMA chain scission are determined to be ionization events on C atoms of PMMA backbone bond due to analysis of resist weight distributions, obtained by gel permeation chromatography.