Open AccessDevelopment of technology for the formation of vacuum field emission cells using focused ion beams
Author(s) -
Ivan Panchenko,
Nikita Shandyba,
A. S. Kolomiytsev
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1410/1/012236
Subject(s) - field electron emission , materials science , nanoscopic scale , ion beam , ion , etching (microfabrication) , deposition (geology) , focused ion beam , field (mathematics) , nanotechnology , ultra high vacuum , optoelectronics , engineering physics , chemistry , engineering , physics , nuclear physics , paleontology , mathematics , organic chemistry , layer (electronics) , sediment , pure mathematics , biology , electron
The article presents the results of the development of technology for the formation of vacuum field emission structures. Experimental studies of local ion-stimulated deposition of W and C and ion-beam etching were carried out and their effects on the formation of final structures were studied. The technological process of manufacturing nanoscale field emission structures was developed, and experimental samples were fabricated. It is shown that the use of the method of focused ion beams (FIB) demonstrates its advantages compared with other methods.