Open AccessFormation of Gibbs and Langmuir floating layers based on copper nanoparticles: temperature and concentration effects
Author(s) -
N. N. Begletsova,
L. T. Baimagambetova,
V N Mironyuk,
А. И. Смирнова,
С. Б. Вениг,
Н. В. Усольцева,
E. G. Glukhovskoy
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1410/1/012216
Subject(s) - copper , monolayer , arachidic acid , langmuir , nanoparticle , adsorption , aqueous solution , pulmonary surfactant , langmuir adsorption model , chemical engineering , chemistry , pyrolytic carbon , analytical chemistry (journal) , materials science , chromatography , nanotechnology , organic chemistry , langmuir–blodgett film , engineering , pyrolysis
This paper is devoted to study of the formation of Gibbs floating layers from aqueous solutions of copper nanoparticles (Cu NPs) stabilized by the sodium dodecyl sulfate surfactant. Langmuir floating layers of arachidic acid formed on the surface of a water subphase containing Cu NPs were also studied. Adsorption of copper nanoparticles on a monolayer of arachidic acid at different conditions has been investigated. In the experiments the amount of copper nanoparticles in the subphase and the temperature of the subphase were changed. The performed analysis showed that the increase of subphase temperature from 29 to 42 °C leads to the increase of the area occupied by Langmuir floating layers in a liquid-condensed state by 30 and 32 %, respectively. After a single transfer of the floating layer onto the highly oriented pyrolytic graphite substrates, their surface microrelief was investigated by atomic force microscopy (AFM). The AFM scans showed that the obtained copper nanoparticles films contained separate areas with copper particles and their aggregates. With an increase of surface pressure from 10 to 40 mN/m, an increase of the height difference of the surface microrelief from 4 to 7 nm and an increase of the large aggregates number with lateral dimensions about 100 nm were observed.