Open AccessMagnetron sputtering system with reactive plasma assisting for deposition of TixZr1 -xO2 coating resistant to laser radiation
Author(s) -
O. D. Volpian,
А. И. Крикунов,
A. I. Kuzmichev,
E. Zharikova,
Д. В. Чуриков
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1396/1/012044
Subject(s) - materials science , sputtering , coating , sputter deposition , high power impulse magnetron sputtering , plasma , substrate (aquarium) , laser , deposition (geology) , cavity magnetron , nanocomposite , radiation , analytical chemistry (journal) , metallurgy , optoelectronics , thin film , composite material , optics , nanotechnology , chemistry , paleontology , oceanography , chromatography , sediment , geology , biology , physics , quantum mechanics
The magnetron sputtering system with reactive oxygen plasma assisting for deposition of Ti x Zr 1- x O 2 nanocomposite coatings by sputtering a single Ti-Zr target and the results of study of the stability of these coatings to the action of high-power laser radiation are presented. The periodically repeated sequential processes of applying sputtered material onto a substrate and oxidation of the deposited material have been realized for obtaining the optical coating with resistance to the 960 W/cm 2 laser radiation.