Open AccessThe effect of current frequency on the structure, composition and properties of oxide layers formed by plasma electrolytic oxidation on aluminum-silicon alloy
Author(s) -
А. В. Полунин,
E. D. Borgardt,
П. В. Ивашин,
A. Ya. Tverdokhlebov,
М. М. Криштал
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1396/1/012031
Subject(s) - materials science , oxide , silicon , alloy , scanning electron microscope , eutectic system , indentation hardness , metallurgy , layer (electronics) , electrolyte , microanalysis , aluminium , surface finish , surface roughness , analytical chemistry (journal) , composite material , microstructure , electrode , chemistry , organic chemistry , chromatography
Oxide layers formed by plasma electrolytic oxidation (PEO) on pre-eutectic aluminum-silicon alloy 361.0 (9.8 wt.% Si) at various current pulse frequencies (50, 500, and 1000 Hz) were investigated. Scanning electron microscopy (SEM), energy dispersive X-ray microanalysis (EDXMA), x-ray diffraction analysis (XRD) were applied for the investigation of the oxide layers. Thickness, roughness, microhardness, wear resistance and thermal conductivity of the obtained oxide layers were measured. It was found that at a forming current frequency of 500 Hz, the best productivity of forming of the oxide layer is achieved, and the layer has the best hardness and wear resistance, and the smallest roughness.