
The study of relief parameters of fluorocarbon coatings antiadhesive to microorganisms formed on polymer materials
Author(s) -
В. М. Елинсон,
E. D. Kravchuk,
P. A. Schur
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1396/1/012015
Subject(s) - fluorocarbon , polytetrafluoroethylene , materials science , polymer , chemical engineering , root mean square , surface roughness , surface finish , composite material , polymer chemistry , engineering , electrical engineering
The problems of the formation of fluorocarbon coatings in a plasma-forming mixture CF 4 + C 6 H 12 on the surface of polyethyleneterephthalate and polytetrafluoroethylene by ion-plasma technology are considered with the aim of increasing mushroom resistance, in particular, the relief parameters of the formed coatings (root-mean-square deviation of the roughness, average high heterogeneity peaks, average distance between peaks) and their influence on mushroom resistance