Open AccessLow energy implantation of nitrogen ions by extended beam with a ballistic focusing in a stainless steel
Author(s) -
A. I. Ryabchikov,
Yu. Kh. Akhmadeev,
I. V. Lopatin,
О. В. Крысина,
D. O. Sivin,
О. С. Корнева,
P.S. Anan'in,
S. V. Dektyarev
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1393/1/012125
Subject(s) - materials science , ion , etching (microfabrication) , nitrogen , ion beam , plasma , ion implantation , chromium , cathode , nitride , hardness , beam (structure) , layer (electronics) , metallurgy , analytical chemistry (journal) , atomic physics , composite material , chemistry , optics , physics , organic chemistry , quantum mechanics , chromatography
The results of experiments on low-energy nitrogen ions implantation in stainless steel AISI 321 are presented. The treatment was carried out with a pulsed beam of nitrogen ions obtained using a ballistic system of ion focusing. The source of ions was nitrogen plasma of a non-independent gas arc discharge with a heated cathode. It was shown that the specimen surface is subjected to ion etching, which leads to the formation of a well, whose profile depends on the ionic exposure parameters. In addition, when treating specimen in such a system, the surface hardness increases up to 4 times. The increase in hardness occurs due to the formation of a modified layer in the surface, with a thickness of up to 50 microns, containing iron and chromium nitrides.