Open AccessFormation of the silicon coating on the NiTi substrate by magnetron sputtering
Author(s) -
К. В. Круковский,
О. А. Кашин,
A. V. Luchin
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1393/1/012100
Subject(s) - materials science , sputter deposition , coating , silicon , sputtering , substrate (aquarium) , radio frequency , optoelectronics , cavity magnetron , titanium , nickel titanium , metallurgy , thin film , composite material , electrical engineering , nanotechnology , engineering , oceanography , geology , shape memory alloy
The paper studies the regularities of silicon coatings formation on a substrate of an alloy based on nickel titanium using the radio-frequency (RF) magnetron sputtering method. It is shown that the use of the RF magnetron sputtering method allows making a silicon coating with a thickness more than 6 μm. It is determined that treatment time has the main influence on the thickness of a coating. The magnitude of the RF-power level of magnetron sputtering has a smaller effect on the thickness of the emerging coating.