Open AccessParameters of magnetron sputtering gas discharge plasma with a small anode
Author(s) -
С. З. Сахапов
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1382/1/012168
Subject(s) - anode , cavity magnetron , plasma , materials science , sputter deposition , electrode , voltage , electric discharge in gases , sputtering , analytical chemistry (journal) , optoelectronics , electrical engineering , chemistry , thin film , physics , engineering , nanotechnology , quantum mechanics , chromatography
The plasma parameters of magnetron sputtering with a small cylindrical anode were investigated by electrical methods. Measurements of the current-voltage characteristics of the gas discharge were carried out. It is shown that changes in the operating modes of the magnetron are possible using an additional electrode of small size, to which a positive voltage is supplied from an independent source.