z-logo
open-access-imgOpen Access
Development of acoustic and diffuse mismatch models for predicting the Kapitza resistance
Author(s) -
V. I. Khvesyuk,
B. Liu,
А. А. Баринов
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1382/1/012155
Subject(s) - interfacial thermal resistance , sapphire , diffusion , materials science , thermal , silicon , mechanics , thermal resistance , physics , acoustics , heat transfer , thermodynamics , optics , optoelectronics , laser
This paper is devoted to the acoustic mismatch model and diffusion mismatch model of Kapitza thermal resistance. We consider that diffusion in the transition layer can be represented by variable composition and finite thickness instead of previous assumptions of a “black box” approximation. The effect of heat flow on the interface is reviewed in the acoustic mismatch model where energy is transferred between two different materials and the critical incident angles are taken into account. Finally we provide calculations of the Kapitza resistance for several interfaces (Metal-Sapphire and Metal-Silicon).

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here