Open AccessNumerical optimization of hydrogen microwave plasma reactor for diamond film deposition
Author(s) -
Michael Hrebtov,
M. S. Bobrov
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1382/1/012010
Subject(s) - nozzle , microwave , plasma , diamond , hydrogen , materials science , ion source , dissociation (chemistry) , atomic physics , deposition (geology) , optoelectronics , chemistry , aerospace engineering , composite material , physics , engineering , nuclear physics , paleontology , organic chemistry , sediment , quantum mechanics , biology
We present the results of optimization of microwave plasma generation in a prototypical diamond film deposition device by means of numerical simulation. The modification of the device was done by changing the shape of microwave resonant chamber, where the plasma generation occurs, in a way to focus the discharge near the outlet nozzle. The best results were obtained for a configuration with an addition of a conducting rod located on the axis of the chamber. This modified configuration provided a two orders of magnitude increase in electron number density near the nozzle exit and about 10 time increase (up to 5%) in dissociation degree of hydrogen molecules.