z-logo
open-access-imgOpen Access
The effects of dielectric barrier discharge atmospheric air plasma treatment to germination and enhancement growth of sunflower seeds
Author(s) -
S. Yawirach,
S. Sarapirom,
Keratiya Janpong
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1380/1/012148
Subject(s) - dielectric barrier discharge , contact angle , germination , sunflower , helianthus annuus , wetting , atmospheric pressure plasma , materials science , plasma , sunflower seed , chemistry , horticulture , dielectric , zoology , composite material , biology , physics , optoelectronics , quantum mechanics
This research was to study the effectiveness of dielectric barrier atmospheric plasma (DBD) on sunflower seed ( Helianthus annuus ). The DBD plasma was driven with a power of 90 watts. The samples consisted of five groups; control group, samples 1, 2, 3 and 4 being treated by DBD plasma with time limits of 30 s, 60 s, 90 s and 120 s, respectively. The physical properties and chemical properties were observed using SEM and water contact angle. Growth parameters were studied by the water uptake, seed germination, sprouts length and dry weight. Compared with the control sample the results showed the contact angle decreased and the wettability increased. The surface roughness in all conditions increased with increased power. With bigger power the water absorption decreased and super hydrophilic was achieved with 120 s treatment. The water uptake of plasma produced the best result using the DBD plasma treatment of 120s. The distribution of sprouts length and the dry weight both increased with increased power. The DBD plasma treatment on sunflower seeds improves seed germination rate and lead to a significant change in wettability and growth parameter.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here