Open AccessEstablishing A Laser Treatment To Suppress The Sec-Ondary Electron Emission
Author(s) -
Yigang Wang,
Siwei Wang,
Bangle Zhu,
Xiangtao Pei,
Bo Zhang,
Xue Ge,
Yong Wang
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1350/1/012176
Subject(s) - laser , scanning electron microscope , wavelength , electron , materials science , synchrotron radiation , optics , synchrotron , sample (material) , electron microscope , optoelectronics , chemistry , physics , nuclear physics , chromatography
Laser treatment has a significant influence on suppressing the secondary electron emission (SEE) in electron storage rings. A new synchrotron radiation light source, the Hefei Advanced Light Source(HALS), is under consideration and it has a strict requirement to suppress the SEE. In this paper, we used a laser with the wavelength of 355nm to process with copper sample. After the laser treatment, the secondary electron yield (SEY) reduces from 2.05 to 0.86. We also used the scanning electron microscope (SEM) to analysis the surface of the sample after the laser treatment. This paper reports the experiment set up and preliminary results.