Open AccessElectric properties of carbon films deposited by magnetron sputtering with ion assistance
Author(s) -
M. A. Grushin,
E.A. Kralkina,
P. A. Neklyudova,
A. M. Nikonov
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1328/1/012029
Subject(s) - krypton , materials science , neon , argon , ion , sputtering , sputter deposition , graphite , carbon fibers , plasma , substrate (aquarium) , atomic physics , range (aeronautics) , biasing , cavity magnetron , analytical chemistry (journal) , thin film , voltage , nanotechnology , chemistry , composite material , electrical engineering , physics , nuclear physics , oceanography , organic chemistry , engineering , chromatography , geology , composite number
The paper deals with the study of ion assistance impact on structure and electrophysical properties of the carbon films deposited by magnetron sputtering of graphite targets. The flow of assisting ions was generated in the plasma reactor based on inductive RF discharge located in the external magnetic field. The change of the ionic current density in the range from 0.5 to 1 mA/cm 2 was provided. Ion energy was changed by biasing the substrate in the range from 10 to 85 V. Neon, argon and krypton were used as working gases. The electrophysical properties of carbon films are shown to depend non-monotonous on energy of the assisting ions.