Open AccessMethod of the coating thickness and transmittance control during the film deposition process
Author(s) -
A. A. Uhov,
А. Е. Komlev,
V. V. Gerasimov,
V. V. Karzin,
D. K. Kostrin,
L. M. Selivanov,
В. А. Симон
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1313/1/012056
Subject(s) - transmittance , deposition (geology) , coating , materials science , substrate (aquarium) , resistive touchscreen , evaporation , process (computing) , optics , vacuum deposition , optoelectronics , composite material , computer science , layer (electronics) , computer vision , physics , geology , paleontology , oceanography , sediment , thermodynamics , operating system
A method of the coating thickness and transmittance control during the film deposition is proposed. The photometric setup on the basis of vacuum resistive evaporation installation is presented. The stages of the spectral data processing algorithm are described. The substrate holder carousel is shown as part of the installation.