Open AccessI-V characteristics of magnetron with hot target sputtered in three-component gas mixture
Author(s) -
В. М. Шаповалов,
A E Shabalin
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1313/1/012048
Subject(s) - cavity magnetron , analytical chemistry (journal) , sputter deposition , nitrogen , oxygen , titanium , maxima , materials science , high power impulse magnetron sputtering , atomic physics , chemistry , physics , sputtering , thin film , metallurgy , nanotechnology , art , organic chemistry , chromatography , performance art , art history
The discharge current-voltage characteristics of a dc magnetron with a single cold titanium target and a single hot titanium target in Ar + N 2 + O 2 environment were studied. Two series of experiments, in which the flow rates of nitrogen Q N 2 and oxygen Q o 2 played different roles, were performed. In the first series, O 2 was introduced into a mixture of Ar + N 2 ( Q N 2 = const and Q o 2 = var). In the second one, N 2 was introduced into a mixture of Ar + O 2 ( Q N 2 = const and Q o 2 = var). It was found that the I-V characteristics of the studied sputtering instruments measured in the current density range of 10–200 mA/cm 2 differ significantly. The I-V characteristics of a magnetron with a cold target can have one maximum or jump. The I-V characteristics of a magnetron with a hot target have two maxima and one minimum in one case, and in the other case, there is only one maximum.