Open AccessI-V characteristics of magnetron with hot titanium target sputtered in argon-oxygen mixture
Author(s) -
E. A. Minzhulina,
В. М. Шаповалов,
Necdet Aslan,
Д. С. Шестаков
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1313/1/012042
Subject(s) - argon , cavity magnetron , titanium , materials science , oxide , analytical chemistry (journal) , titanium oxide , oxygen , thermionic emission , sputter deposition , sputtering , atomic physics , metallurgy , chemistry , thin film , electron , nanotechnology , physics , organic chemistry , chromatography , quantum mechanics
The discharge current-voltage characteristics of a dc magnetron with a single hot titanium target in Ar + O 2 environment are studied. It was found that the I-V characteristics measured in the range of current densities of 10-200 mA/cm 2 have three inflection points and a maximum. The competition of several processes can cause the discovered features. In the oxide target operating mode, these processes include the chemical reaction for the formation of oxide on the surface of the target and its sputtering by argon ions. In the metal mode, gas rarefaction near the target and thermionic emission compete.