Open AccessFeatures of vanadium dioxide films deposition by reactive magnetron sputtering
Author(s) -
А. Е. Komlev,
E. S. Shutova,
M. P. Sypko
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1313/1/012034
Subject(s) - vanadium , sputter deposition , materials science , sputtering , vanadium oxide , vanadium dioxide , substrate (aquarium) , deposition (geology) , stoichiometry , cavity magnetron , chemical engineering , crystal (programming language) , analytical chemistry (journal) , inorganic chemistry , metallurgy , thin film , chemistry , nanotechnology , environmental chemistry , geology , computer science , paleontology , oceanography , sediment , engineering , programming language
In this work, influence of substrate material and technological process parameters on the stoichiometric composition, crystal structure and phase transition character in vanadium oxide films deposited by the magnetron sputtering method is investigated.