
Determination of the threshold sensitivity of a deposited dielectric film thickness control method based on surface plasmon resonance effect
Author(s) -
А. Е. Komlev,
R. V. Dyukin,
E. S. Shutova
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1313/1/012033
Subject(s) - materials science , refractive index , dielectric , surface plasmon resonance , sensitivity (control systems) , surface plasmon , excitation , surface plasmon polariton , optics , resonance (particle physics) , range (aeronautics) , optoelectronics , surface (topology) , plasmon , composite material , electronic engineering , nanotechnology , physics , nanoparticle , atomic physics , geometry , mathematics , engineering , quantum mechanics
The lower boundaries of the real time measuring range of the dielectric film thickness on the sensor surface, the principle of which is based on the effect of the excitation of surface electromagnetic waves (SEW), are determined. The simulation was performed for materials with high and low refractive index.