Open AccessEffect of working gas on the deposition rate of CaP coatings formed by radio frequency magnetron sputtering of a hydroxyapatite target
Author(s) -
Alexander Fedotkin,
Anna Kozelskaya,
Sergei I. Tverdokhlebov
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1313/1/012018
Subject(s) - deposition (geology) , sputter deposition , materials science , cavity magnetron , sputtering , radio frequency , inert gas , plasma , analytical chemistry (journal) , metallurgy , thin film , chemistry , composite material , nanotechnology , environmental chemistry , geology , physics , paleontology , telecommunications , quantum mechanics , sediment , computer science
This study is dedicated to the influence of the inert working gas on the deposition rate of CaP coatings formed by radio frequency magnetron sputtering of a hydroxyapatite target in Ar, Kr and Xe. The optical emission spectra of plasma, the elemental and phase composition of the formed coatings are investigated. The deposition rates of the CaP coatings formed in Ar and Kr are approximately comparable and higher than ones formed in Xe.