Open AccessReactive magnetron sputtering of hot titanium target in mixture of argon and nitrogen
Author(s) -
В. М. Шаповалов,
E. A. Minzhulina,
Д. С. Шестаков,
A. V. Kochin
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1281/1/012071
Subject(s) - titanium , cavity magnetron , nitrogen , argon , materials science , sputter deposition , sputtering , high power impulse magnetron sputtering , analytical chemistry (journal) , metallurgy , chemistry , atomic physics , nanotechnology , thin film , environmental chemistry , physics , organic chemistry
The influence of nitrogen flow rate on the discharge I-V characteristics of a dc magnetron with a single hot titanium target is studied. The basic processes forming the discharge are determined. The discharge physical models are proposed.