Open AccessStructure and mechanical characteristics of CrAlC films doped with silicon
Author(s) -
А. П. Рубштейн,
A. B. Vladimirov,
С.А. Плотников
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1281/1/012065
Subject(s) - materials science , doping , crystallinity , nanocrystalline material , silicon , nanocrystalline silicon , silicon carbide , amorphous solid , composite material , graphite , sputtering , amorphous silicon , thin film , chemical engineering , nanotechnology , metallurgy , optoelectronics , crystallography , crystalline silicon , chemistry , engineering
CrAlC and CrAlSiC films have been obtained and investigated. Simultaneous sputtering of graphite and Cr 05 Al 05 or Cr 035 Al 055 Si 0 08 targets was used for films deposition. The structure of the films is amorphous-nanocrystalline. The doping of CrAlC films with silicon is accompanied by an increase in their crystallinity due to the formation of silicon carbide particles. Structural changes make CrAlSiC films harder with a higher resistance to plastic deformation.