Open AccessStructural features and nitrogen positions in titanium oxynitride films grown in plasma of magnetron discharge
Author(s) -
В. Ф. Пичугин,
A. A. Pustovalova,
K. E. Evdokimov,
M. E. Konishchev,
Oleg S. Kuzmin,
E. L. Boytsova,
Natalia Beshchasna,
Anton Ficai,
Danagul Aubakirova,
Zheng Sun
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1281/1/012062
Subject(s) - materials science , nanocrystalline material , titanium , crystallite , rutile , anatase , cavity magnetron , nitride , sputter deposition , nitrogen , titanium nitride , titanium oxide , chemical engineering , coating , phase (matter) , metallurgy , deposition (geology) , sputtering , thin film , composite material , nanotechnology , layer (electronics) , chemistry , photocatalysis , geology , paleontology , biochemistry , organic chemistry , sediment , catalysis , engineering
The paper addresses the results of the analysis of the structural features of nitrogen-containing titanium oxides films, deposited by reactive magnetron sputtering. The films have a nanocrystalline two-phase structure and consist of anatase and rutile crystallites, regardless of the coating deposition regimes. No traces of titanium nitride phase are found in the film and nitrogen atoms in oxide form are localized at the grain boundaries of the deposited film.