Open AccessA TEM structural study of thermal stability of magnetic tunnel junctions integrated with CMOS devices
Author(s) -
Vlado K. Lazarov,
A. Köhn,
Thomas Uhrmann,
Théodoros Dimopoulos,
Hubert Brückl,
H. Achard,
C. Baraduc,
Sébastien Vizzini,
Hamid Oughaddou,
B. Aufray,
F. Arnaud d’Avitaya
Publication year - 2008
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/126/1/012002
Subject(s) - annealing (glass) , materials science , thermal stability , amorphous solid , optoelectronics , cmos , thermal , nanotechnology , composite material , crystallography , chemical engineering , chemistry , physics , meteorology , engineering