Open AccessStatistical study of the variable speed of an AACVD device implemented in the UTP
Author(s) -
Juan Manuel Montes Hincapié,
E Y Castrillon,
W Olarte,
R. Dorantes,
Beatríz Cruz Muñoz
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1221/1/012077
Subject(s) - chemical vapor deposition , nozzle , materials science , coating , deposition (geology) , substrate (aquarium) , repeatability , reproducibility , thin film , transmittance , optoelectronics , nanotechnology , chemical engineering , composite material , analytical chemistry (journal) , electronic engineering , chemistry , mechanical engineering , organic chemistry , engineering , chromatography , paleontology , oceanography , sediment , geology , biology
The spray assisted chemical vapor deposition (AACVD) technique is used to make thin film growth through the spraying of a precursor solution in the form of droplets, by means of a nozzle moving horizontally along the substrate. One of the most influential variables in the growth of the films is the speed with which the nozzle moves, since the deposition uniformity depends on this, which is directly related to the different physical properties of the coating. This paper briefly shows the electronic control built for the manipulation of this variable and a statistical study is presented that allowed to determine that the experimental speed presents oscillations less than 10% with respect to the programmed value. In addition, comparative transmittance spectra are shown where the reproducibility and repeatability of the coatings manufactured with the AACVD equipment built in the UTP is observed.