Open AccessOptical characterization of MoS2 sputtered thin films
Author(s) -
Noriyuki Hasuike,
S. Yamauchi,
Kousuke Seki,
Susumu Kamoi,
Koji Nishio,
Kenji Kisoda
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1220/1/012057
Subject(s) - crystallinity , thin film , materials science , annealing (glass) , sputtering , sputter deposition , raman scattering , raman spectroscopy , optoelectronics , analytical chemistry (journal) , composite material , mineralogy , optics , nanotechnology , chemistry , physics , chromatography
We studied on the crystallinity of as-sputtered and annealed MoS 2 thin films by Raman scattering. The samples were prepared by RF magnetron sputtering, and the thermal annealing was carried out under sulfurous atmosphere. Although as-sputtered MoS 2 thin films clearly showed the deterioration of the lattice ordering, it was drastically improved by the thermal annealing due to the sulfurization of the sample. And since the sulfurization occurred remarkably on the top surface of MoS 2 sputtered thin films, it was expected to be an effective method to realize a few-layer MoS 2 sputtered thin films with high crystallinity.