Open AccessIn-depth evolution of tellurium films deposited by Frequency Assisted Thermal Evaporation in Vacuum (FATEV)
Author(s) -
Temenuga Hristova-Vasileva,
I. Bineva,
R. Todorov,
Adrian Dinescu,
Cosmin Romaniţan
Publication year - 2019
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1186/1/012026
Subject(s) - scanning electron microscope , materials science , tellurium , evaporation , ellipsometry , vacuum evaporation , surface roughness , thin film , vacuum deposition , analytical chemistry (journal) , surface finish , optics , nanotechnology , composite material , chemistry , metallurgy , physics , chromatography , thermodynamics