Open AccessXPS characterization of thin (Al2O3)x(TiO2)1-x films deposited on silicon
Author(s) -
P. Vitanov,
P. Stefanov,
A. Harizanova,
T. Ivanova
Publication year - 2008
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/113/1/012036
Subject(s) - x ray photoelectron spectroscopy , materials science , thin film , silicon , analytical chemistry (journal) , dielectric , impurity , stoichiometry , substrate (aquarium) , chemical engineering , nanotechnology , chemistry , metallurgy , optoelectronics , chromatography , oceanography , organic chemistry , geology , engineering