Open AccessFilm nanostructure formation during low-temperature PVD deposition using partially ionized atomic fluxes
Author(s) -
I. G. Marchenko,
I. M. Neklyudov
Publication year - 2008
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/113/1/012014
Subject(s) - nanostructure , materials science , atomic layer deposition , deposition (geology) , physical vapor deposition , ionization , nanotechnology , chemical engineering , ion , thin film , chemistry , geology , paleontology , organic chemistry , sediment , engineering