Open AccessNanometer-scale oxidation of Silicon surface by ICP plasma
Author(s) -
I. E. Clemente,
A. V. Miakonkikh,
Sergey Averkin,
К. В. Руденко
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/8/081038
Subject(s) - plasma , silicon , materials science , nanometre , etching (microfabrication) , layer (electronics) , oxide , ellipsometry , analytical chemistry (journal) , nanostructure , plasma processing , deposition (geology) , plasma etching , chemical engineering , nanotechnology , thin film , chemistry , optoelectronics , environmental chemistry , metallurgy , composite material , paleontology , physics , quantum mechanics , sediment , engineering , biology