Open AccessResearch of using plasma methods for formation field emitters based on carbon nanoscale structures
Author(s) -
В. С. Климин,
A A Rezvan,
O A Ageev
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/7/071020
Subject(s) - materials science , field electron emission , common emitter , sputter deposition , etching (microfabrication) , plasma , sputtering , work function , chemical vapor deposition , carbon fibers , isotropic etching , layer (electronics) , nanostructure , electron , nanotechnology , optoelectronics , thin film , composite material , physics , quantum mechanics , composite number