Open AccessInfluence of sputtering parameters on the main characteristics of ultra-thin vanadium nitride films
Author(s) -
Philipp Zolotov,
A. Divochiy,
Yu. B. Vakhtomin,
А. В. Лубенченко,
Pavel V. Morozov,
И. В. Шуркаева,
К. В. Смирнов
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/5/051030
Subject(s) - materials science , sputtering , thin film , vanadium nitride , substrate (aquarium) , vanadium , deposition (geology) , optoelectronics , superconductivity , nitride , sputter deposition , niobium nitride , detector , analytical chemistry (journal) , condensed matter physics , nanotechnology , metallurgy , optics , chemistry , layer (electronics) , physics , paleontology , oceanography , chromatography , sediment , geology , biology