Open AccessEffect of temperature on dry etching of III-V structures
Author(s) -
И. А. Морозов,
A. S. Gudovskikh,
D. A. Kudryashov,
K. P. Kotlyar,
K. Yu. Shubina
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/4/041031
Subject(s) - resist , dry etching , etching (microfabrication) , lithography , reactive ion etching , materials science , nanotechnology , chemistry , chemical engineering , optoelectronics , engineering , layer (electronics)