Open AccessSurface morphology after reactive ion etching of silicon and gallium arsenide based solar cells
Author(s) -
Nikola Papěž,
Dinara Sobola,
A Gajdoš,
Ľubomír Škvarenina,
Robert Macků,
Marek Eliáš,
Alois Nebojsa,
Rastislav Motúz
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/4/041015
Subject(s) - materials science , raman spectroscopy , etching (microfabrication) , gallium arsenide , solar cell , silicon , reactive ion etching , spectroscopy , optoelectronics , analytical chemistry (journal) , crystallite , optics , nanotechnology , chemistry , layer (electronics) , metallurgy , physics , quantum mechanics , chromatography