Open AccessFabrication method of the patterned mask for controllable growth of low-dimensional semiconductor nanostructures
Author(s) -
Liliia N. Dvoretckaia,
А. М. Можаров,
Vladimir V. Fedorov,
A D Bolshakov,
I. S. Mukhin
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/2/022042
Subject(s) - materials science , photoresist , optoelectronics , fabrication , photolithography , molecular beam epitaxy , silicon , nanostructure , substrate (aquarium) , nanotechnology , semiconductor , diode , crystalline silicon , nanowire , epitaxy , medicine , alternative medicine , pathology , oceanography , layer (electronics) , geology