Open AccessPreparation of flat surfaces on silicon carbide substrate using electron beam processing
Author(s) -
E Yu Gusev,
S. P. Avdeev
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/2/022026
Subject(s) - materials science , silicon , etching (microfabrication) , polishing , surface roughness , substrate (aquarium) , surface finish , scanning electron microscope , cathode ray , silicon carbide , electron , analytical chemistry (journal) , optics , optoelectronics , nanotechnology , composite material , chemistry , oceanography , physics , layer (electronics) , quantum mechanics , chromatography , geology