Open AccessInvestigation of deposition conditions on the structural properties of µc-Si:H
Author(s) -
A. V. Uvarov,
A. S. Gudovskikh,
Vladimir V. Fedorov
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/2/022009
Subject(s) - raman spectroscopy , plasma enhanced chemical vapor deposition , microcrystalline , deposition (geology) , materials science , layer (electronics) , silicon , amorphous solid , hydrogen , phase (matter) , chemical engineering , crystallography , mineralogy , chemistry , nanotechnology , metallurgy , organic chemistry , optics , geology , paleontology , sediment , physics , engineering