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Analytical–Monte Carlo model of the growth of In nanostructures during droplet epitaxy on the triangle-patterned GaAs substrates
Author(s) -
С. В. Балакирев,
М. С. Солодовник,
I A Mikhaylin,
M. M. Eremenko,
O A Ageev
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1124/2/022001
Subject(s) - nucleation , nanostructure , kinetic monte carlo , materials science , monte carlo method , substrate (aquarium) , epitaxy , indium , deposition (geology) , nanotechnology , condensed matter physics , optoelectronics , chemical physics , layer (electronics) , chemistry , physics , thermodynamics , paleontology , statistics , mathematics , oceanography , sediment , geology , biology

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