
Optimization of 10nm Bi-GFET Device for higher ION/IOFF ratio using Taguchi Method
Author(s) -
Ameer F. Roslan,
K. E. Kaharudin,
F. Salehuddin,
Anis Suhaila Mohd Zain,
Ibrahim Ahmad,
Z. A. Noor Faizah,
Hazura Haroon,
A. R. Hanim,
Siti Khadijah Idris,
A. M. Zaiton,
Norhidayah Mohamad,
Aidil Abdul Hamid
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1123/1/012046
Subject(s) - implant , taguchi methods , tilt (camera) , materials science , ion , ion implantation , optoelectronics , physics , mathematics , geometry , composite material , medicine , surgery , quantum mechanics