Open AccessFormation of metal-oxide film nanostructures based on anodic alumina with uniformly distributed nanoscale Ta inclusions and their electrical properties
Author(s) -
Katsiaryna Chernyakova,
Igor Vrublevsky,
Е. Н. Муратова,
В. А. Мошников
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1121/1/012010
Subject(s) - materials science , anodizing , nanostructure , tantalum , oxide , nanopore , metal , nanoscopic scale , dielectric , phase (matter) , bilayer , electrical resistivity and conductivity , chemical engineering , nanotechnology , aluminium , composite material , metallurgy , optoelectronics , chemistry , membrane , biochemistry , organic chemistry , engineering , electrical engineering