
Deposition of polysiloxane coatings by runaway electrons preionized diffuse discharge in nitrogen flow
Author(s) -
М. В. Ерофеев,
М. А. Шулепов,
Vasilii Ripenko,
В. Ф. Тарасенко
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1115/3/032069
Subject(s) - plasma enhanced chemical vapor deposition , coating , chemical vapor deposition , nitrogen , materials science , substrate (aquarium) , deposition (geology) , titanium , analytical chemistry (journal) , silicon , plasma , carbon fibers , volumetric flow rate , fourier transform infrared spectroscopy , condensation , composite material , chemistry , chemical engineering , nanotechnology , metallurgy , organic chemistry , paleontology , oceanography , physics , thermodynamics , quantum mechanics , sediment , geology , composite number , engineering , biology