Open AccessThe influence of technological parameters on the optical properties of photosensitive structures based on porous silicon
Author(s) -
Н. В. Латухина,
D. A. Lizunkova,
В. Д. Паранин,
G. A. Rogozhina
Publication year - 2018
Publication title -
journal of physics conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/1096/1/012124
Subject(s) - porous silicon , materials science , silicon , photosensitivity , reflection coefficient , porosity , reflection (computer programming) , diffusion , optoelectronics , layer (electronics) , light reflection , composite material , range (aeronautics) , optics , thermodynamics , physics , computer science , programming language
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom