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Fabrication of low resistivity p-type ZnO thin films by implanting N+ ions
Author(s) -
Shih Chang Tsai,
Yang Lu,
MinHsiung Hon
Publication year - 2008
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/100/4/042037
Subject(s) - materials science , electrical resistivity and conductivity , thin film , band gap , annealing (glass) , optoelectronics , transmittance , sputter deposition , ion , sputtering , analytical chemistry (journal) , nanotechnology , composite material , chemistry , electrical engineering , engineering , organic chemistry , chromatography

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